发明名称 SUBSTRATE PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing device having no limit to the number of processing rooms connectable with a conveyance room, being capable of conveying a substrate to the processing room while keeping an atmosphere of the substrate to be processed under a predetermined environment. SOLUTION: At least one processing room 3A-3F is provided for processing a substrate internally contained in a substrate processing device. A conveyance case 4 contains the substrate under the condition of being separated from external atmosphere, having an entrance for carrying in or taking out the substrate. A conveyance mechanism 5 conveys the conveyance case 4 to a first position for carrying in or taking out the substrate to the processing room. An installation mechanism 40 of the conveyance case is isolated from the conveyance mechanism to independently fix the conveyance case at the first position. The conveyance case 4 is removably supported against the conveyance mechanism. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008283215(A) 申请公布日期 2008.11.20
申请号 JP20080192320 申请日期 2008.07.25
申请人 TOKYO ELECTRON LTD 发明人 MATSUOKA TAKAAKI;IWABUCHI KATSUHIKO;ISHIZAWA SHIGERU;HIROKI TSUTOMU
分类号 H01L21/677;H01L21/00 主分类号 H01L21/677
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