发明名称 |
METHOD FOR FABRICATING THREE-DIMENSIONAL PHOTONIC CRYSTAL |
摘要 |
A method for fabricating a three-dimensional photonic crystal comprises the steps of: forming a dielectric thin film; injecting ions selectively into the dielectric thin film by using a focus ion beam to form a mask on the dielectric thin film; forming a pattern by selectively removing an exposed part of the dielectric thin film at which the mask is not formed on the dielectric thin film; forming a sacrificial layer on the dielectric thin film having the pattern formed therein; and flattening the sacrificial layer formed on the dielectric thin film until the pattern comes to the surface.
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申请公布号 |
US2008286892(A1) |
申请公布日期 |
2008.11.20 |
申请号 |
US20080119168 |
申请日期 |
2008.05.12 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
WANG SHINAN;TAMAMORI KENJI;MOTOI TAIKO;OKUNUKI MASAHIKO;ONO HARUHITO;AIBA TOSHIAKI |
分类号 |
H01L21/00;G02B6/10 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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