| 摘要 |
A bipolar photo-electrochemical process is disclosed for electroless deposition (referred to as photo Bi-OCD) of a metallic compound onto the top surface of a semiconducting substrate whereby differential illumination of the front side of the substrate versus the back side of the substrate provides a driving force to separate the cathodic and anodic partial reactions leading to high yield deposition of the metallic compound. A selective photo Bi-OCD process is further disclosed whereby the top surface of the substrate is at least partly covered with an insulating pattern such that the deposition of the metallic compound takes place selectively into the openings of the pattern.
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