| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new compound utilizable as a component of a resist composition, especially as an acid-generating agent. <P>SOLUTION: The compound is represented by general formula (I) [wherein, R<SP>1</SP>is an organic group except a (meth)acryloyl group; R<SP>2</SP>is a linear or branched 1-5C alkylene group or a fluorinated alkylene group; R<SP>3</SP>is a substituted or nonsubstituted phenyl group, 1-naphthyl group or 2-naphthyl group; and R<SP>4</SP>is a 1-5C fluorinated alkyl group]. Preferably, R<SP>3</SP>is a substituted or nonsubstituted 1-naphthyl group or 2-naphthyl group, and R<SP>1</SP>is a substituted or nonsubstituted alkyl group. <P>COPYRIGHT: (C)2009,JPO&INPIT |
