发明名称 |
THIN FILM TRANSISTOR AND MANUFACTURING METHOD FOR THE SAME |
摘要 |
<p>The thin film transistor of the stable electrical characteristic can be provided by forming the passivation layer with the compound of the halogen and group 2 elements in manufacturing a thin-film transistor. The thin film transistor and manufacturing method thereof comprise the substrate(21) having the insulating layer(22); the gate(23) formed in the partial region of insulating layer; the gate isolation layer formed on the insulating layer and gate; the channel region(25) formed in the region corresponding to the gate on the gate isolation layer; the source(26a) and drain(26b) contacting the both sides of the channel area; the passivation layer(27) formed on the channel region, including the compound of the halogen and group 2 elements.</p> |
申请公布号 |
KR20080099084(A) |
申请公布日期 |
2008.11.12 |
申请号 |
KR20070044721 |
申请日期 |
2007.05.08 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KANG, DONG HUN;SONG, I HUN;FORTUNATO ELVIRA;MARTINS RODRIGO |
分类号 |
H01L29/786 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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