发明名称 THIN FILM TRANSISTOR AND MANUFACTURING METHOD FOR THE SAME
摘要 <p>The thin film transistor of the stable electrical characteristic can be provided by forming the passivation layer with the compound of the halogen and group 2 elements in manufacturing a thin-film transistor. The thin film transistor and manufacturing method thereof comprise the substrate(21) having the insulating layer(22); the gate(23) formed in the partial region of insulating layer; the gate isolation layer formed on the insulating layer and gate; the channel region(25) formed in the region corresponding to the gate on the gate isolation layer; the source(26a) and drain(26b) contacting the both sides of the channel area; the passivation layer(27) formed on the channel region, including the compound of the halogen and group 2 elements.</p>
申请公布号 KR20080099084(A) 申请公布日期 2008.11.12
申请号 KR20070044721 申请日期 2007.05.08
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KANG, DONG HUN;SONG, I HUN;FORTUNATO ELVIRA;MARTINS RODRIGO
分类号 H01L29/786 主分类号 H01L29/786
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