A PLASMA HEAD FOR PROCESSING A LARGE SIZE SUBSTRATE AND A PLASMA PROCESSING SYSTEM USING THE SAME

摘要

A plasma head is provided to perform uniform plasma process on the objects of large area by arranging electrodes in a different method. A plasma head comprises the dielectric base electrode(10) of the flat type having a plurality of penetration holes(hole)(11); the ground electrode group(20) consisting of a plurality of ground electrodes, positioned beneath the dielectric base electrode. The ground electrode is a metal material bar. The reaction gas is supplied to the ground electrode group through the hole of the dielectric base electrode. The dielectric base electrode is made of a dielectric and a metal for electrode.