| 摘要 |
A resist stripper composition is provided to ensure excellent removal property against hardened resist and dry/wet etching residue in the manufacture of a flat panel display and to realize excellent anti-corrosive effect of aluminium and aluminium alloy wire, copper and copper alloy line. A non-aqueous resist stripper composition comprises an alkanolamine compound 5~30 weight%, a glycol ether compound 50~90 weight%, a hydroxy benzene compound 0.1~10 weight% and an azole-based compound 0.1~10 weight% based on the weight of the total composition. The alkanolamine compound is 1 or 2 kinds or more selected from a group consisting of monoethanolamine, diethanolamine, 2-aminoethanol, 2-(ethylamino) ethanol, 2-(methylamino) ethanol, N-methyldiethanol amine, dimethylaminoethanol, diethylamino ethanol, 2-(2-aminoetoxy) ethanol, 1-amino-2-propanol, triethanolammine, monopropanolamine, monoisopropanolamine and dibutanolamine. |
