发明名称 |
Projection exposure mask acceptance decision system, projection exposure mask acceptance decision method, method for manufacturing semiconductor device, and computer program project |
摘要 |
A projection exposure mask acceptance decision system includes assurance object measuring unit to measure quality assurance objects relating to projection exposure mask, first exposure characteristic deterioration quantity calculating unit to calculate first exposure characteristic deterioration quantity caused by deviations in average values of the quality assurance objects measured by the measuring unit, second exposure characteristic deterioration quantity calculating unit to calculate second exposure characteristic deterioration quantity caused by dispersion in the quality assurance objects measured by the measuring unit, sum calculating unit to calculate simple sum of the first and second quantity, root sum square calculating unit to calculate root sum square of the first and second quantity, entire exposure characteristic deterioration quantity calculating unit to calculate entire exposure characteristic deterioration quantity as an interior division value of the simple sum and root sum square, and judgment unit to judge whether the entire exposure characteristic deterioration quantity is acceptable value.
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申请公布号 |
US7446852(B2) |
申请公布日期 |
2008.11.04 |
申请号 |
US20070653279 |
申请日期 |
2007.01.16 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
ARISAWA YUKIYASU;MIMOTOGI SHOJI;HASEBE SHIGERU |
分类号 |
G03B27/68;G03B27/52;G03F1/84;G03F7/20;H01L21/027 |
主分类号 |
G03B27/68 |
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地址 |
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