| 摘要 |
<p>A semiconductor mask is provided to accurately observe the desired contact hole cross section of the pitch by shifting the pattern of the contact hole from the mask with a constant frequency, even though the cutting is performed in any place. As to a semiconductor mask(10) including the contact hole pattern(20) having a plurality of row(24) and column(22), the contact hole pattern differently forms the location of column about the row, where one or more row is adjacent, so that location of row and column cross each other. The column of the contact hole pattern compose the multiple columns are formed over one into one group. On the whole, it is segmented by a plurality of groups. It has the location of the row in which the groups of this multiple disagree and the location is formed.</p> |
