| 摘要 |
THE PRESENT INVENTION PROVIDES A POSITIVE TYPE PHOTOSENSITIVE RESIST COMPOSITION IN WHICH A HIGHLY SENSITIVE AND INEXPENSIVE PHOTO-ACID-GENERATOR CAN BE USED, AND WHICH CAN BE EXPOSED USING NEAR ULTRAVIOLET LIGHT AND DEVELOPED WITH A WEAK ALKALI, HAS A HIGH RESOLUTION, AND CAN BE ADAPTED TO SUBSTRATES THAT HAVE THROUGH-HOLES.THE PRESENT INVENTION IS A POSITIVE TYPE PHOTOSENSITIVE RESIST COMPOSITION COMPRISING AN ACID-SENSITIVE COPOLYMER WHICH COMPRISES A FIRST CONSTITUTIONAL UNIT EXPRESSED BY THE FOLLOWING GENERAL FORMULA (1)(IN FORMULA (1), X INDICATES A HYDROGEN ATOM OR A METHYL 15 GROUP),A SECOND CONSTITUTIONAL UNIT EXPRESSED BY THE FOLLOWING GENERAL FORMULA (2) (IN FORMULA (2),R¹ INDICATES A HYDROGEN ATOM OR A METHYL GROUP,R² INDICATES A LINEAR OR BRANCHED UNSUBSTITUTED ALKYL GROUP WITH1 TO 6 CARBON ATOMS,A LINEAR OR BRANCHED ALKYL GROUP WITH 1 TO 6 CARBON ATOMS THAT IS SUBSTITUTED BY A HYDROXY GROUP, A LINEAR OR BRANCHED ALKYL GROUP WITH 1 TO 6 CARBON ATOMS THAT IS SUBSTITUTED BY A HALOGEN ATOM,A LINEAR OR BRANCHED ALKYL GROUP WITH 1 TO 6 CARBON ATOMS THAT IS SUBSTITUTED BY A CYANO GROUP A LINEAR OR BRANCHED ALKYL GROUP WITH 1 TO 6 CARBON ATOMS THAT IS SUBSTITUTED BY A DIALKYLAMINO GROUP),AND A THIRD CONSTITUTIONAL UNIT EXPRESSED BY THE FOLLOWING GENERAL FORMULA (3) (IN FORMULA (3) R³ INDICATES A HYDROGEN ATOMS OR A METHYL OR A METHYL GROUP,R⁴ INDICATES A HYDROGEN ATOM,A HALOGEN ATOM OR LINEAR OR BRANCHED UNSUBSTITUTED ALKYL GROUP WITH 1 TO 6 CARBON ATOMS.Y INDICATES A HYDROGEN ATOM,A LINEAR OR BRANCHED UNSUBSTITUTED ALKYL GROUP WITH 1 TO 6 CARBON ATOMS OR A LINEAR OR BRANCHED SUBSTITUTED ALKYL GROUP WITH 1 TO 6 CARBON ATOMS,Z INDICATES A LINEAR OR BRANCHED UNSUBSTITUTED ALKYL GROUP WITH 1 TO 6 CARBON ATOMS OR A LINEAR OR BRANCHED SUBSTITUTED ALKYL GROUP WITH 1 TO 6 CARBON ATOMS,AND Y MAY ALSO BE BONDED TO Z TO FORM A RING SYSTEM.
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