发明名称 CIRCUIT SUBSTRATE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a circuit substrate capable of forming a convex pattern on a metal layer of a carrier where a metal layer is laminated, and forming a high density circuit pattern by transferring the convex pattern to an insulating layer. SOLUTION: The method for manufacturing the circuit substrate is characterized by comprising a step of forming a convex pattern corresponding to a circuit pattern on the metal layer of a carrier where a metal layer is laminated, a step of laminating and pressing the carrier on an insulating layer so as to allow the convex pattern to face the insulation layer, a step of transferring the metal layer and the convex pattern to the insulating layer by removing the carrier, a step of forming a via hole in the insulating layer where the metal layer is transferred, a step of filling the via hole by plating the insulating layer where the metal layer is transferred, and a step of forming a plating layer on the metal layer. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008263188(A) 申请公布日期 2008.10.30
申请号 JP20080077961 申请日期 2008.03.25
申请人 SAMSUNG ELECTRO-MECHANICS CO LTD 发明人 PARK JUNG-HYUN;MIN BYOUNG-YOUL;PARK JEONG-WOO;CHOI JONG-GYU;KIM JI-EUN;KANG MYUNG-SAM
分类号 H05K3/40;H05K3/00;H05K3/20;H05K3/22 主分类号 H05K3/40
代理机构 代理人
主权项
地址