| 摘要 |
Methods for removing adhesive from a photomask after a pellicle has been removed from the photomask are herein disclosed. In some embodiments, after a pellicle is removed from a photomask, adhesive residue remaining on the photomask is subjected to removal by an energy source, such as an excimer laser. The excimer laser may be in close proximity to a surface of the photomask which contains the adhesive residue. In some embodiments, removal of the photomask may be followed by a physical cleaning process such as megasonic cleaning or jet nozzle cleaning to remove any residual adhesive left behind.
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