| 摘要 |
An apparatus (10) and method for generating gas-phase active chemical species suitable for selectively processing one side of a textile (16) or nonwoven material are described. Processing includes etching or stripping coatings, as examples. A low-temperature plasma (22) is used to produce an ionized gas containing radical species, atoms, ions, and electrons, some of which are suitable for removing or modifying the coating. For the purposes of the present invention, the plasma may be generated in a vacuum, or at atmospheric pressure. Dielectric-barrier discharges, atmospheric-pressure plasma jets, micro hollow-cathode discharges, coronas, or plasmas produced by a microwave discharge or laser-supplied energy may be used to generate the required species. |
