| 摘要 |
PROBLEM TO BE SOLVED: To solve the following problem: an etching residue is generated in patterning a transparent electrode on a photodiode and the etching residue causes short-circuit between wirings or photodiodes, resulting in deterioration in yield or display defect, in a TFT array substrate to be provided on the phtotosensor used for an X ray imaging and displaying device, etc. SOLUTION: In this flat panel photosensor, a transparent electrode formed on a photodiode is formed of either IZO (indium zinc oxide), ITZO (indium tin zinc oxide) or ITSO (indium tin silicon oxide), and thus, the generation of etching residue can be suppressed and a photosensor having less defect can be formed. COPYRIGHT: (C)2009,JPO&INPIT
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