发明名称 |
EUV OPTICS |
摘要 |
In a first aspect, a method of fabricating an EUV light source mirror is disclosed which may comprise the acts/steps of providing a plurality of discrete substrates; coating each substrate with a respective multilayer coating; securing the coated substrates in an arrangement wherein each coated substrate is oriented to a common focal point; and thereafter polishing at least one of the multilayer coatings. In another aspect, an optic for use with EUV light is disclosed which may comprise a substrate; a smoothing layer selected from the group of materials consisting of Si, C, Si<SUB>3</SUB>N<SUB>4</SUB>, B<SUB>4</SUB>C, SiC and Cr, the smoothing layer material being deposited using highly energetic deposition conditions ^nd a multilayer dielectric coating. In another aspect, a corrosion resistant, multilayer coating for an EUV mirror may comprise alternating layers of Si and a compound material having nitrogen and a 5th period transition metal. |
申请公布号 |
WO2008020965(A3) |
申请公布日期 |
2008.10.16 |
申请号 |
WO2007US16648 |
申请日期 |
2007.07.24 |
申请人 |
CYMER, INC.;FOMENKOV, IGOR, V.;BOWERING, NORBERT, R. |
发明人 |
FOMENKOV, IGOR, V.;BOWERING, NORBERT, R. |
分类号 |
G02B1/00;B32B7/02;B32B9/00;G01J1/00;G02B5/08;G02B7/182;G03F9/00;G21G4/00;H01J35/20;H01L21/31;H01L21/311 |
主分类号 |
G02B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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