| 摘要 |
PROBLEM TO BE SOLVED: To prevent a residual gas in a processing container from diffusing to a conveyance chamber in a vacuum processing apparatus equipped with the conveyance chamber, set in a vacuum atmosphere having a conveyance means connected with a conveyance port of the processing container for processing, by a processing gas under the vacuum atmosphere via a gate chamber for transferring a substrate. SOLUTION: The vacuum processing apparatus is designed so as to provide the processing container, the conveyance chamber, a gate valve provided in the gate chamber for closing the conveyance port, when processing the substrate in the processing container and for opening the port, when transferring the substrate to the container. An inert gas supply part and an exhaust port are provided, respectively in the gate chamber so that a flow of an inert gas is formed at a position exposed to the conveyance port, to prevent the residual gas in the processing chamber from diffusing into the conveyance chamber, while at least the conveyance port is open; and accordingly, the residual gas in the processing container is prevented from diffusing from the conveyance port and contaminating the conveyance chamber. COPYRIGHT: (C)2009,JPO&INPIT
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