| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a base multiplying agent that is more inexpensive and has preferable heat resistance, and to provide a resin composition and a photosensitive resin composition containing the base multiplying agent. <P>SOLUTION: The base multiplying agent has at least one structure expressed by formula (1) and is decomposed by heating at 150°C or higher in the presence of an amino compound to produce an amino compound. In formula (1), each of R<SP>1</SP>to R<SP>5</SP>independently represents a hydrogen atom, halogen atom, hydroxyl group, amino group, mercapto group, nitro group, silyl group, silanol group or monovalent organic group and may be identical to or different from one another or may be bonded to one another to form a cyclic structure; and R<SP>6</SP>represents a substituted or unsubstituted aliphatic hydrocarbon group or a substituted or unsubstituted aromatic hydrocarbon group. <P>COPYRIGHT: (C)2009,JPO&INPIT |
