| 摘要 |
Adverse effects when a carrier is open, such as particles adhesion to the substrate or natural oxidation film deposits on the substrate, as well as a rise in oxygen concentration and contamination of the substrate transfer chamber are prevented. Semiconductor manufacturing apparatus includes a carrier ( 10 ) in which a cover unit ( 10 a) is provided on a substrate loading/unloading opening ( 10 b) for loading and unloading a substrate ( 9 ), a carrier open/close chamber ( 61 ) continuously arranged to the carrier ( 10 ), a substrate transfer chamber ( 16 ) continuously arranged to the carrier open/close chamber, a substrate processing chamber continuously arranged to the substrate transfer chamber, an exhaust means ( 63 ) for exhausting the atmosphere in the carrier open/close chamber by suction, and an exhaust quantity adjuster means ( 65, 66 ) for adjusting the suction exhaust quantity of the exhaust means. |
