发明名称 MECHANISM FOR FORMING A REMOTE DELTA DOPING LAYER OF A QUANTUM WELL STRUCTURE
摘要 A method of fabricating a quantum well device includes forming a diffusion barrier on sides of a delta layer of a quantum well to confine dopants to the quantum well.
申请公布号 WO2008121714(A1) 申请公布日期 2008.10.09
申请号 WO2008US58446 申请日期 2008.03.27
申请人 INTEL CORPORATION;JIN, BEEN;MAJUMDAR, AMLAN;KAVALIEROS, JACK;DATTA, SUMAN;CHAU, ROBERT 发明人 JIN, BEEN;MAJUMDAR, AMLAN;KAVALIEROS, JACK;DATTA, SUMAN;CHAU, ROBERT
分类号 H01L29/778;H01L29/768 主分类号 H01L29/778
代理机构 代理人
主权项
地址