发明名称 |
APPARATUS AND METHODS OF FORMING A GAS CLUSTER ION BEAM USING A LOW-PRESSURE SOURCE |
摘要 |
Embodiments of a gas cluster ion beam apparatus (100) and methods for forming a gas cluster ion beam (128) using a low-pressure process source (535) are generally described herein. In one embodiment, the low-pressure process source (535) is mixed with a high-pressure diluent source (512) in a static pump (500) to form a mixed source, from which a gas cluster jet (118) is generated and ionized to form the gas cluster ion beam. Other embodiments may be described and claimed. |
申请公布号 |
WO2008118738(A2) |
申请公布日期 |
2008.10.02 |
申请号 |
WO2008US57627 |
申请日期 |
2008.03.20 |
申请人 |
TOKYO ELECTRON LIMITED;TOKYO ELECTRON AMERICA, INC.;LANE, SCOTT |
发明人 |
LANE, SCOTT |
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