发明名称 APPARATUS AND METHODS OF FORMING A GAS CLUSTER ION BEAM USING A LOW-PRESSURE SOURCE
摘要 Embodiments of a gas cluster ion beam apparatus (100) and methods for forming a gas cluster ion beam (128) using a low-pressure process source (535) are generally described herein. In one embodiment, the low-pressure process source (535) is mixed with a high-pressure diluent source (512) in a static pump (500) to form a mixed source, from which a gas cluster jet (118) is generated and ionized to form the gas cluster ion beam. Other embodiments may be described and claimed.
申请公布号 WO2008118738(A2) 申请公布日期 2008.10.02
申请号 WO2008US57627 申请日期 2008.03.20
申请人 TOKYO ELECTRON LIMITED;TOKYO ELECTRON AMERICA, INC.;LANE, SCOTT 发明人 LANE, SCOTT
分类号 主分类号
代理机构 代理人
主权项
地址