| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processor and a substrate processing method for generating a frozen film on a substrate surface while suppressing the deterioration of the durability of a substrate peripheral member. SOLUTION: This substrate treatment method is provided to discharge mixed fluid acquired by mixing oxygen with nitrogen gas from a cooling nozzle 3 as a cooling medium, and to move the cooling nozzle 3 from a stand-by position Ps to a rotation center position Pc of a substrate W. In this case, when the cooling nozzle 3 is faced to a substrate surface Wf, the cooling temperature (discharge cooling medium temperature) is sharply reduced. Then, the cooling nozzle 3 faced to the substrate surface Wf of the rotatively driven substrate W is moved toward an end edge position Pe of the substrate W. Thus, the region (frozen region) on which a liquid film 11 is frozen in the surface region of the substrate surface Wf is spread from the central part to peripheral part of the substrate surface Wf. The drop of the cooling medium temperature is maintained while the substrate surface Wf is scanned by the cooling nozzle 3. COPYRIGHT: (C)2009,JPO&INPIT
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