发明名称 THIN FILM SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME
摘要 A thin film semiconductor device is provided that includes a semiconductor thin film and a gate electrode. The semiconductor thin film has an active region turned into a polycrystalline region through irradiation with an energy beam. The gate electrode is provided to traverse the active region. In a channel part that is the active region overlapping with the gate electrode, a crystalline state is changed cyclically in a channel length direction, and areas each having a substantially same crystalline state traverse the channel part.
申请公布号 US2008241981(A1) 申请公布日期 2008.10.02
申请号 US20080134698 申请日期 2008.06.06
申请人 SONY CORPORATION 发明人 MACHIDA AKIO;FUJINO TOSHIO;KONO TADAHIRO
分类号 H01L21/00 主分类号 H01L21/00
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