| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an abrasive composition for final polishing which ensures the dispersion stability of abrasive grains even after dilution, and does not cause clogging at filtration via a filter. <P>SOLUTION: The abrasive composition contains abrasive grains, a water-soluble polymer compound, one or two or more types of positive ion surfactants, and a basic monomer composition. Particularly, the abrasive composition contains a water-soluble polysaccharide, such as hydroxyethyl cellulose, as the water-soluble polymer compound, a fourth-class ammonium compound as the positive ion surfactant, and a nitride-element-containing basic compound as the basic monomer composition. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
