CORRECTION OF OPTICAL ELEMENTS BY MEANS OF CORRECTION LIGHT EMITTED IN A FLAT MANNER

摘要

The present invention relates to a correction light device for the irradiation of optical elements of an optical arrangement, in particular a lens, preferably a microlithography lens having a correction light, comprising at least one correction light source and at least one mirror arrangement (22) that deflects the light from the correction light source in the beam path to the optical element (6) such that at least parts of at least one surface (9) of at leat one optical element of the optical arrangement are irradiated in a locally and/or temporally variable fashion, wherein the correction light strikes the surface (9) of the optical element at a flat angle such that the obtuse angle between the optical axis of the optical arrangement at the location of the optical element and the correction light beam is less than or equal to 105°, particularly less than or equal to 100°, preferably less than or equal to 95°.