| 摘要 |
Information on the side of the body of an exposure apparatus is effectively used on the side of the laser light source apparatus. There is provided a laser light source apparatus (16) which supplies a laser beam (LB) to an body (20) of an exposure apparatus (EX) which exposes a wafer, and includes a controller (12) adjusting an operation condition of the laser light source apparatus (16) based on exposure information (EI) about the exposure operation supplied from the body (20) of the exposure apparatus. The exposure information (EI) is exemplified by information on the waiting time until the light emission start or light emission continuation time and the operation condition is exemplified by the gas pressure in an emission chamber (1) in which a laser beam is emitted, the temperature in the emission chamber and a number of revolutions of a blower (4) in the emission chamber.
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