发明名称 Optical retardation plate and method of manufacturing the same
摘要 A dielectric substrate having a refractive index n<SUB>1 </SUB>is covered with an amorphous dielectric medium having a refractive index n<SUB>2 </SUB>larger than the refractive index n<SUB>1</SUB>, and a rectangular grating is formed in the amorphous dielectric medium through an etching process. When microcrystal is formed in the amorphous dielectric medium through a thermal treatment to increase the refractive index n<SUB>2</SUB>, a magnitude Deltan of structure double refraction increases accordingly. Hence, a phase refraction DeltaPhi of an irregular grating pattern in the rectangular grating becomes large without increasing a depth D of each trench of the rectangular grating, and thus it is possible to obtain an optical retardation plate having a fine periodic structure and having a desired plate retardation.
申请公布号 US7428101(B2) 申请公布日期 2008.09.23
申请号 US20050064602 申请日期 2005.02.24
申请人 CANON KABUSHIKI KAISHA 发明人 ISANO TAISUKE
分类号 G02B5/18;C03B32/02;G02B5/30;G02B27/00 主分类号 G02B5/18
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