| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device having a marking that can be recognized in higher level at an external surface thereof and also provide a method for manufacturing the semiconductor device. SOLUTION: The semiconductor device 10 has a marking 16 at the external surface thereof. The marking 16 is provided on a conductive material 14 (metal surface) formed of a metal as a part of the external surface, and the front surface of the conductive material 14 on which the marking 16 is formed is constituted as the surface smoother than the front surface of the other metal surface. Therefore, since the marking is formed on the metal surface constituting the external surface, the recognition level of the marking can be maintained to the level higher than the constant level by suppressing deterioration by aging of the marking. Moreover, deterioration of mechanical strength of the semiconductor device itself due to irradiation of laser can also be suppressed. COPYRIGHT: (C)2008,JPO&INPIT |
