发明名称 Ion implantation simulation apparatus, method, and program
摘要 The group creation part divides n ion particles into groups of a group G<SUB>1</SUB>, a group G 2 , . . . , and a group G<SUB>k</SUB>. The individual area setting part sets an initial condition calculation area 1 a, as an individual area of the group G<SUB>1</SUB>, and makes the calculation part calculate movement of the ion particle. Then, one by one, the individual area setting part sets an individual area of a group G<SUB>i+1</SUB>, based on a range Rp, a dispersion sigmaL, etc. indicating a calculation result of an ion particle belonging to the group G<SUB>i</SUB>. Further, the individual area setting part implants an ion particle belonging to the group G<SUB>i+1 </SUB>into the individual area of the group G<SUB>i+1 </SUB>and makes the calculation part calculate movement of the implanted ion particle.
申请公布号 US7424411(B2) 申请公布日期 2008.09.09
申请号 US20050030982 申请日期 2005.01.10
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 ITO SANAE
分类号 G06F17/10;H01L21/265 主分类号 G06F17/10
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