| 摘要 |
<p>A foreign matter or abnormal unsmoothness inspection apparatus and a foreign matter or abnormal unsmoothness inspection method are provided to detect reliably a foreign matter or an abnormal unsmoothness on an order of submicrons on a substrate-shaped measuring object together with positional information thereof. A detection unit detects a foreign matter or an abnormal unsmoothness by measuring smoothness of a surface of a substrate-shaped measuring target(1). A marking unit forms a concave part on a surface of the measuring target at a predetermined horizontal distance from the foreign matter or the abnormal unsmoothness. A mass spectrum measuring unit detects the concave part by irradiating or scanning a primary ion beam on the surface of the measuring object and at from the concave part, and measures a mass spectrum of secondary ions emitted from a position at a predetermined horizontal distance.</p> |
