发明名称 ION MILLING APPARATUS AND METHOD OF ION MILLING PROCESSING
摘要 PROBLEM TO BE SOLVED: To provide an ion milling apparatus and a method of ion milling processing which make unnecessary time and effort of resetting a sample in a sample stage mechanism whenever a processing region is changed. SOLUTION: The ion milling apparatus includes an ion gun generating an ion beam for being irradiated to a sample, a sample chamber housing the sample, within which an irradiation processing by the ion beam is carried out, an exhaust apparatus exhausting in order to keep the sample chamber vacuum, a gas injection mechanism injecting gas for generating ions, and a sample stage mechanism setting and rotating the sample. The sample stage mechanism includes a rotary table carrying and rotating the sample, a rotating mechanism driving the rotary table, an eccentric mechanism capable of eccentrically adjusting a positional relationship between a rotation center axis of the rotary table and a centerline of the ion beam, and a sample position adjusting mechanism capable of eccentrically adjusting a positional relationship between a centerline of the sample set on the sample stage and the rotation center axis of the rotary table. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008204905(A) 申请公布日期 2008.09.04
申请号 JP20070042225 申请日期 2007.02.22
申请人 HITACHI HIGH-TECH SCIENCE SYSTEMS CORP 发明人 IWATANI TORU;MUTO HIROSHI;TAKABORI SAKAE
分类号 H01J37/20;H01J37/317 主分类号 H01J37/20
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