发明名称 Photosensitive Transfer Material, Pattern Forming Process, and Patterns
摘要 The present invention aims to provide a photosensitive transfer material which allows for preventing light fog under safelight even with a highly sensitive photosensitive transfer layer, and is particularly preferably used in producing printed circuit boards and color filters for liquid crystal displays (LCDs). For this end, the present invention provides a photosensitive layer having a support, and a cushion layer, an oxygen insulation layer, and a photosensitive layer formed on the support, at least any one of the cushion layer and the oxygen insulation layer has light absorbing properties of which absorbance at a wavelength ranging from 500 nm to 600 nm is 1 or more and absorbance at a wavelength ranging from 350 nm to 450 nm is 0.3 or less. In the photosensitive transfer material, at least any one of the oxygen insulation layer and the cushion layer contains a dye.
申请公布号 US2008213688(A1) 申请公布日期 2008.09.04
申请号 US20050573881 申请日期 2005.08.16
申请人 FUJIFILM CORPORATION 发明人 IWASAKI MASAYUKI
分类号 G03F7/004;G03F7/26 主分类号 G03F7/004
代理机构 代理人
主权项
地址