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发明名称
制造薄膜电晶体阵列的方法
摘要
本发明提供一种用于制造薄膜电晶体阵列之方法。所述方法包括:在基板上形成闸电极;形成堆叠结构,其中闸极绝缘层、半导体层以及导电层顺序地堆叠于具有闸电极之基板上;将导电层乾式蚀刻成未经划分为源电极以及汲电极之电极图案;以及蚀刻电极图案之通道区域以形成源电极以及汲电极,且同时蚀刻未被电极图案覆盖之图案区域之半导体层以暴露闸极绝缘层。
申请公布号
TW200836349
申请公布日期
2008.09.01
申请号
TW096122907
申请日期
2007.06.25
申请人
ICD股份有限公司
发明人
李承虎;郑富溶;郑钟必;郑胜赫
分类号
H01L29/786(2006.01);H01L21/336(2006.01)
主分类号
H01L29/786(2006.01)
代理机构
代理人
詹铭文;萧锡清
主权项
地址
韩国
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