APPARATUS FOR DEPOSITING THIN FILM AND METHOD OF DEPOSITING THE SAME

摘要

An apparatus and a method for depositing a thin film are provide to obtain a thin film having a uniform thickness by preventing impurities from being formed in a nozzle tube that supplies processing gas. An apparatus for depositing a thin film comprises a chamber(10) having an internal space defined by a substrate holder(40) and an inner wall of the chamber, and a nozzle tube(30). The nozzle tube includes a first end portion(31) fixed to the inner wall of the chamber, a second end portion(32) extending toward the internal space of the chamber, a fluid path(33) extending through the first end portion to the second end portion of the nozzle tube, and at least one slit(34) formed in the second end portion of the nozzle tube to open the fluid path. The nozzle tube includes a long nozzle tube and a short nozzle tube shorter.