发明名称 Particle monitoring apparatus and vacuum processing apparatus
摘要 A particle monitoring apparatus including a light source configured to emit plural light fluxes, a projecting optical system configured to convert the plural light fluxes into a band-shaped light flux, to lead the band-shaped light flux into a flow passage of a given gas stream, and to partially superpose the plural light fluxes to form a substantially uniform light intensity distribution of the band-shaped light flux in a widthwise direction; a light detector configured to detect intensity of light; and a particle detector configured to determine sizes of the particles passing the light flux based on intensities of the scattered lights detected by the light detector and to count the number of the particles.
申请公布号 US7417732(B2) 申请公布日期 2008.08.26
申请号 US20050271945 申请日期 2005.11.14
申请人 KABUSHIKI KAISHA TOPCON;TOKYO ELECTRON LIMITED 发明人 IWA YOICHIRO;MIYAKAWA KAZUHIRO;SAITO SUSUMU
分类号 G01N15/02 主分类号 G01N15/02
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