发明名称 |
Method and apparatus for measuring temperature of substrate |
摘要 |
The temperature of the surface and/or inside of a substrate is measured by irradiating the front surface or rear surface of the substrate, whose temperature is to be measured, with light and measuring the interference of a reflected light from the substrate and a reference light. A method and apparatus for measuring temperature or thickness which is suitable for directly measuring the temperature of the outermost surface layer of a substrate, and an apparatus for treating a substrate for an electronic device, which uses such method, are provided.
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申请公布号 |
US7416330(B2) |
申请公布日期 |
2008.08.26 |
申请号 |
US20050196402 |
申请日期 |
2005.08.04 |
申请人 |
ITO MASAFUMI;OKAMURA YASUYUKI;SHIINA TATSUO;ISHII NOBUO;SUZUKI TOMOHIRO;KOSHIMIZU CHISHIO |
发明人 |
ITO MASAFUMI;OKAMURA YASUYUKI;SHIINA TATSUO;ISHII NOBUO;SUZUKI TOMOHIRO;KOSHIMIZU CHISHIO |
分类号 |
G01J5/08;G01J5/00;G01K11/12;G01N25/00;H01L21/324 |
主分类号 |
G01J5/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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