发明名称 Structure and method of sub-gate and architectures employing bandgap engineered SONOS devices
摘要 A bandgap engineered SONOS device structure for design with various AND architectures to perform a source side injection programming method. The BE-SONOS device structure comprises a spacer oxide disposed between a control gate overlaying an oxide-nitride-oxide-nitride-oxide stack and a sub-gate overlaying a gate oxide. In a first embodiment, a BE-SONOS sub-gate-AND array architecture is constructed multiple columns of SONONOS devices with sub-gate lines and diffusion bitlines. In a second embodiment, a BE-SONOS sub-gate-inversion-bitline-AND architecture is constructed multiple columns of SONONOS devices with sub-gate inversion bitlines and with no diffusion bitlines.
申请公布号 US7414889(B2) 申请公布日期 2008.08.19
申请号 US20060419977 申请日期 2006.05.23
申请人 MACRONIX INTERNATIONAL CO., LTD. 发明人 LUE HANG-TING;LIEN HAO MING
分类号 G11C11/34;G11C16/06 主分类号 G11C11/34
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