发明名称 PARTICLE MONITORING SYSTEM AND SUBSTRATE-TREATING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a particle monitoring system detecting fine particles. SOLUTION: In a bypass line 16 for connecting a chamber 11 to a DP 17, a laser beam oscillator 21 for applying laser beams, and a laser power measuring instrument 22 positioned on an optical path in laser beams L that are applied from the laser beam oscillator 21 and pass through the space in the bypass line 16, are arranged. Further, on the inner wall surface of the bypass line 16, a plurality of laser reflection mirrors 23 are arranged to reflect the laser beams L so that at least two optical paths of the laser beams L are positioned in the space in the bypass line 16. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008187040(A) 申请公布日期 2008.08.14
申请号 JP20070019888 申请日期 2007.01.30
申请人 TOKYO ELECTRON LTD 发明人 MORIYA TAKESHI;ENOMOTO TAKASHI
分类号 H01L21/205;C23C16/44;H01L21/3065 主分类号 H01L21/205
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