| 发明名称 |
Method for fabricating thin film pattern, device and fabricating method therefor, method for fabricating liquid crystal display, liquid crystal display, method for fabricating active matrix substrate, electro-optical apparatus, and electrical apparatus |
| 摘要 |
A method for fabricating a thin film pattern on a substrate, includes the steps of: forming a concave part on the substrate that conforms to the thin film pattern; and applying a function liquid into the concave part.
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| 申请公布号 |
US7410905(B2) |
申请公布日期 |
2008.08.12 |
| 申请号 |
US20040854668 |
申请日期 |
2004.05.27 |
| 申请人 |
SEIKO EPSON CORPORATION |
发明人 |
USHIYAMA TOSHIHIRO;HIRAI TOSHIMITSU;MIKOSHIBA TOSHIAKI;KIGUCHI HIROSHI;HASEI HIRONORI |
| 分类号 |
G02F1/1343;H01L21/30;B05D1/26;B05D5/12;B05D7/00;B41J2/01;C30B1/00;G02F1/133;G02F1/1345;G02F1/1362;G02F1/1368;H01L21/00;H01L21/027;H01L21/288;H01L21/3205;H01L21/336;H01L21/768;H01L21/77;H01L21/84;H01L27/12;H01L27/32;H01L29/786;H01L51/40;H01L51/56;H05K3/00;H05K3/10;H05K3/12 |
主分类号 |
G02F1/1343 |
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