发明名称 SEMICONDUCTOR SUBSTRATE WITH MULTIPLE CRYSTALLOGRAPHIC ORIENTATIONS
摘要 A pair of semiconductor structures and a method for fabricating a semiconductor structure each utilize a semiconductor substrate having a first crystallographic orientation, and a dielectric layer located thereupon. The method provides for epitaxially growing a semiconductor layer on the semiconductor substrate to encapsulate the dielectric layer. The method also provides for patterning the semiconductor layer to yield a semiconductor structure that comprises a bulk semiconductor structure and a semiconductor-on-insulator structure, or alternatively a patterned semiconductor layer that straddles the dielectric layer and contacts the semiconductor substrate.
申请公布号 US2008185592(A1) 申请公布日期 2008.08.07
申请号 US20060306713 申请日期 2006.01.09
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 KIM BYEONG Y.;CHEN XIAOMENG;LEE WOO-HYEONG;ZHU HUILONG
分类号 H01L29/04;H01L21/20 主分类号 H01L29/04
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