RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS

摘要

A radiation system (1) for generating a beam of radiation (2) that defines an optical axis (3) is provided. The radiation system (1) includes a plasma produced discharge source (4) for generating EUV radiation. The discharge source (4) includes a pair of electrodes (5) constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes (5) so as to provide a discharge (7) in the plasma between the electrodes (5). The radiation system (1) also includes a debris catching shield (11) for catching debris (8) from the electrodes (5). The debris catching shield (11) is constructed and arranged to shield the electrodes (5) from a line of sight provided in a predetermined spherical angle relative the optical axis (3), and to provide an aperture (12) to a central area (10) between the electrodes (5) in the line of sight.