| 摘要 |
Apparatus for cleaning and drying a semiconductor wafer container includes a load port with a fixture that receives a dirty container and delivers it to a deck assembly. A carrier receives the container for further handling. A robot with a first end effector removes the container door and places it on a portion of the carrier. The robot includes a second end effector that engages the carrier and elevates the carrier and container for insertion into a process chamber. The process chamber includes a rotor with at least one receptacle. The spinning rotor creates both high pressure and low pressure regions. A processing fluid is provided onto the container and carrier. After a rinse stage and while the rotor is rotating, the container and carrier are dried. The robot then removes both the container and the carrier from the process chamber and reassembles the door to the container. |
