发明名称 |
SURFACE CHARACTERISTIC ANALYSIS |
摘要 |
In one embodiment, a system to measure defects on a surface of a wafer and an edge of the wafer using a single tool comprises a scatterometer to identify at least one defect region on the surface and a surface profile height measuring tool to measure one or more characteristics of the surface in the defect region with a surface profile height measuring tool.
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申请公布号 |
US2008180656(A1) |
申请公布日期 |
2008.07.31 |
申请号 |
US20070627677 |
申请日期 |
2007.01.26 |
申请人 |
KLA-TENCOR TECHNOLOGIES CORPORATION |
发明人 |
MEEKS STEVEN W.;SAPPEY ROMAIN;CARR TOM |
分类号 |
G01B11/30 |
主分类号 |
G01B11/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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