| 摘要 |
An objective is to provide an electromagnetic wave shielding material exhibiting an excellent electromagnetic wave shielding property, and also to provide a manufacturing method with quick and simple processing, in which a thin-line-state picture image can easily be formed. An electromagnetic wave shielding material exhibiting an excellent near-infrared shielding property can further be provided if desired. Disclosed is an electromagnetic wave shielding material possessing a support and provided thereon, a conductive metal layer, wherein the conductive metal layer satisfies at least one of the following conditions; (1) a void ratio of the conductive metal layer is 0.1-15%, (2) Glossiness of the conductive metal layer is 50-300%, and (3) Center line average surface roughness (Ra) of the conductive metal layer is 1-50 nm.
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