PROCESS FOR PRODUCING FLUOROCARBON MICROSTRUCTURE, FLUOROCARBON MICROSTRUCTURE, AND MICROSYSTEM

摘要

A process for producing a fluorocarbon microstructure, in which a fluorocarbon microstructure of three-dimensional arrangement can be easily prepared. The process comprises the first working step of etching substratum (2) to thereby provide film deposition area (9) of given pattern consisting of through-hole configuration on the substratum (2); the preparation step of forming fluorocarbon film (6) on the inner circumferential surface of the film deposition area (9) to thereby prepare a fluorocarbon region surrounded by the fluorocarbon film (6); and the second working step of etching a given region other than the fluorocarbon region of the substratum (2) to thereby prepare fluorocarbon microstructure (4) protruding from the working plane of the substratum (2). Accordingly, there can be prepared fluorocarbon microstructure (4) of three-dimensional arrangement being a complex structure whose preparation has been difficult, so that micro flow channel (1) equipped with the fluorocarbon microstructure (4) of three-dimensional arrangement can be easily produced.