发明名称 Method and Apparatus For A Semiconductor Structure Forming At Least One Via
摘要 One exemplary embodiment of a semiconductor structure can include: (a) a semiconductor substrate of one conductivity type, having a front surface and a back surface and including at least one via through the semiconductor substrate, where the at least one via is filled with a conductive material; and (b) a semiconductor layer disposed on at least a portion of the front or back surface of the semiconductor substrate, where the semiconductor layer is compositionally graded through its depth with one or more selected dopants, and the conductive material is configured to electrically couple the semiconductor layer to at least one front contact disposed on or over the surface of the substrate.
申请公布号 US2008174028(A1) 申请公布日期 2008.07.24
申请号 US20070626036 申请日期 2007.01.23
申请人 GENERAL ELECTRIC COMPANY 发明人 KOREVAAR BASTIAAN ARIE;JOHNSON JAMES NEIL
分类号 H01L29/00;B05D5/12 主分类号 H01L29/00
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