COATING COMPOSITION FOR PHOTOLITHOGRAPHY

摘要

PROBLEM TO BE SOLVED: To provide a new antireflective composition to be used relating to an overcoated photoresist.

SOLUTION: Underlying coating compositions are provided that comprise one or more resins comprising one or more modified imide groups. These coating composition are particularly useful as antireflective layers for an overcoated photoresist layer. Preferred systems can be thermally treated to increase hydrophilicity of the composition coating layer to inhibit undesired intermixing with an overcoated organic composition layer, while rendering the composition coating layer removable with aqueous alkaline photoresist developer.

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