发明名称 RELATIVE EXPOSURE VALUE MEASURING APPARATUS AND METHOD
摘要 The method comprises the steps of providing image signal output device (4); inputting a luminance component of image signal corresponding to a first position of object (1) photographed by the image signal output device (4); correcting the gamma-value of the luminance component corresponding to the first position; inputting a luminance component of image signal corresponding to second position (71) of the object (1) photographed by the image signal output device (4); correcting the gamma-value of the luminance component corresponding to the second position; computing the ratio between the luminance component corresponding to the first position after the gamma correction and the luminance component corresponding to the second position after the gamma correction; and displaying the ratio (72).
申请公布号 KR20080068636(A) 申请公布日期 2008.07.23
申请号 KR20087003642 申请日期 2008.02.15
申请人 LEADER ELECTRONICS CORP. 发明人 IMAMURA GENICHI;TSUNEMOTO HIDEHARU
分类号 H04N5/238;H04N5/235 主分类号 H04N5/238
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