发明名称 |
SUBPAD HAVING ROBUST, SEALED EDGES |
摘要 |
<p>Provided are encapsulated belts and encapsulated pads for use in a variety of polishing application, including the chemical-mechanical polishing and planarization of semiconductor wafers and other workpieces. The encapsulated belts and pads are characterized by a robust seal between a polishing layer of the pad or belt and the edges of the subpad layer of the pad or belt. The robust seal is accomplished by casting a polymer directly over the subpad layer. The edges of the subpad layer may include one or more functional features that promote the formation of a watertight and slurry-resistant seal when the subpad layer is covered with a cast polymer. Also provided is a method of producing a robust seal between the polishing layer and the edge region of the subpad by encapsulating a subpad layer with a polymeric material.</p> |
申请公布号 |
EP1512168(A4) |
申请公布日期 |
2008.07.23 |
申请号 |
EP20030736966 |
申请日期 |
2003.06.09 |
申请人 |
PRAXAIR S.T. TECHNOLOGY, INC. |
发明人 |
CIANCIOLO, JOSEPH;LOMBARDO, BRIAN, SCOTT |
分类号 |
B24B37/22;B24B37/24;B24D13/14;H01L21/321;(IPC1-7):H01L21/00 |
主分类号 |
B24B37/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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