| 摘要 |
<p>A semiconductor device including a measurement mark and a method for forming the same are provided to measure easily an alignment and an overlay by modifying the measurement mark. A first measurement mark region has a rectangular structure and a constant line width. A second measurement mark region includes a plurality of dummy patterns which are perpendicular to a lateral surface of the first measurement mark region. A cylindrical measurement mark(39) is formed at each of the first measurement mark region and the second measurement mark region. A sidewall and a bottom part of the cylindrical measurement mark are composed of conductive layers. Each of line widths of the rectangular structure and the dummy pattern is 10-300nm.</p> |
