发明名称 Thermal interface apparatus, systems, and methods
摘要 An apparatus and system, as well as fabrication methods therefor, may include a substrate coupled to a first material and a second material. The first and second materials may comprise adjacent metals, and may have different coefficients of thermal expansion sufficient to reduce the amount of substrate warp that can occur due to heating and cooling.
申请公布号 US7400040(B2) 申请公布日期 2008.07.15
申请号 US20030458603 申请日期 2003.06.10
申请人 INTEL CORPORATION 发明人 YAP ENG HOOI;TAY CHENG SIEW;TAN PEK CHEW
分类号 H01L23/48;H01L23/373;H01L23/52;H01L29/40;H05K1/02;H05K3/46 主分类号 H01L23/48
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